Multi-function scanning X-ray photoelectron spectroscopy analyzer PHI VersaProbe4

Model

PHI VersaProbe4

Manufacturer

ULVAC-PHI Inc.

Specification

Scanning X-ray source (monochromatic AlKα line, beam diameter adjustable from 10 to 200 μm, capable of scanning from 10 μm up to 1.4 mm × 1.4 mm), Mg/Al dual-anode X-ray source, Ar ion gun, Ar gas cluster ion gun, He ultraviolet source, charged neutralization and low-energy reverse-angle electron gun for electron spectroscopy analysis, reflection electron energy loss spectroscopy electron gun, transfer vessel, heating/cooling stage (500 to -120°C).

Location

Yoshida Campus, Faculty of Engineering Engineering Science Depts Building Basement 1st floor, Room 002

Installation Year

2022

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Overview

It is an X-ray photoelectron spectroscopy (XPS) instrument used to obtain information about the chemical bonding state and composition of the surface of solid materials at a depth of approximately 10 nm. In addition to XPS, it can perform ultraviolet photoelectron spectroscopy (UPS), low-energy inverse photoelectron spectroscopy (LEIPS), and reflection electron energy loss spectroscopy (REELS). It is equipped with both a conventional Ar ion gun and an Ar gas cluster ion gun, allowing depth profiling analysis by etching for various materials. It also has a dedicated transfer vessel and a sample heating/cooling mechanism with 4 terminals, making it compatible with in-situ measurements and other operations.

Responsible department

Materials Sciences and Engineering Department

Available Users

(1) Individuals who belong to a department or the Materials Science Course in the Department of Physics and Engineering in Kyoto University (hereinafter referred to as “the university”).
(2) Faculty or students of Kyoto University who belong to departments or courses other than the specified one.
(3) Individuals affiliated with national or local government bodies, national university corporations or university joint-use institutions, independent administrative institutions, or corporations or organizations engaged in educational or research activities.
(4) Individuals engaged in research and development activities in companies or other organizations.
(5) Other individuals deemed appropriate by the responsible manager.

Notes

Please attend the preliminary training and perform the measurement by yourself.
Please confirm that you are registered as an X-ray operator in your affiliated institution.
Please provide the purpose of use and sample information (shape, size, elements present, conductivity) to the contact information below.
Powder samples are not available for use. Stable solid samples in a vacuum (10-7 Pa) are the target for measurement.
The main target sizes for measurement are 5mm × 5mm to 12mm × 16mm with a thickness of up to 2mm. However, if you have samples outside this range, please consult with us as it may still be possible to measure them.

Usage rules

https://www.t.kyoto-u.ac.jp/ja/research/yui/naiki/20210210-zaiko

Inquiries

Materials Sciences and Engineering Department
Yoshitaro Nose
075-753-5472
nose.yoshitaro.5e*kyoto-u.ac.jp
Materials Sciences and Engineering Department
Nobuharu Sasaki
075-753-5426
sasaki.nobuharu.7a*kyoto-u.ac.jp
※Please send the email to both parties.
※Please change 「*」 to 「@」 and send.

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