Focused ion beam processing and observation device (FIB (FB-2200))
Hitachi High-Tech GLOBAL
- High-speed and large-area processing at the several 100µm level are possible using a high-current ion beam.
- Low-damage sample preparation is possible using a low-acceleration ion beam (minimum acceleration voltage 2kV)
- This is equipped with a micro-pickup system that enables pinpoint preparation of thin film samples.
- Extraction, fixation, and thinning of micro samples at the 10 µm level are all possible within the FIB device.
Installation Location
56
Installation Location 57 North Building 2 (partially located in the DuET experiment building in North Building 1)
User Guide
Kyoto University
Use -by-the-hour
Accepted only between 9 am and 5 pm off campus
Other Research Institutes
Use -by-the-hour
Accepted only between 9 am and 5 pm off campus
Companies, etc.
Public offering
-
Use -by-the-hour
- Users perform measurements on an hourly basis
-
public offering
- Users perform the measurements on an hourly basis
User Guide
Person of Kyoto University：Please contact the person in charge.
Others：Project Zero Emission Energy Research Please contact the person in charge.
(Paid use and use under a joint research agreement are available.)
※For details on how to apply, please refer to the device's website.
http://www.iae.kyoto-u.ac.jp/zero_emission/
Others：Project Zero Emission Energy Research Please contact the person in charge.
(Paid use and use under a joint research agreement are available.)
※For details on how to apply, please refer to the device's website.
http://www.iae.kyoto-u.ac.jp/zero_emission/
Inquiries
Advanced Energy Conversion Division Advanced Energy Structural Materials Research Section（Contact:Omura)
- TEL
- 0774-38-3568
- ohmura.takamasa.2r＊kyoto-u.ac.jp
Please change 「＊」 to 「@」 and send.