Focused ion beam processing and observation device (FIB (FB-2200))
High-speed and large-area processing at the several 100µm level are possible using a high-current ion beam.
Low-damage sample preparation is possible using a low-acceleration ion beam (minimum acceleration voltage 2kV)
This is equipped with a micro-pickup system that enables pinpoint preparation of thin film samples.
Extraction, fixation, and thinning of micro samples at the 10 µm level are all possible within the FIB device.
Installation Location 57 North Building 2 (partially located in the DuET experiment building in North Building 1)
Kyoto University
Use -by-the-hour
Accepted only between 9 am and 5 pm off campus
Other Research Institutes
Use -by-the-hour
Accepted only between 9 am and 5 pm off campus
Companies, etc.
Public offering
Person of Kyoto University:Please contact the person in charge.
Others:Project Zero Emission Energy Research Please contact the person in charge.((Paid use and use under a joint research agreement are available.)
※ For details on how to apply, please refer to the device’s website.
http://www.iae.kyoto-u.ac.jp/zero_emission/
Advanced Energy Conversion Division Advanced Energy Structural Materials Research Section(Contact:Omura)
TEL
0774-38-3568
MAIL
ohmura.takamasa.2r*kyoto-u.ac.jp
※Please change 「*」 to 「@」 and send.